FORMATION OF HIGH-MOBILITY SILICON-GERMANIUM STRUCTURES BY LOW-ENERGY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

Details for Australian Patent Application No. 2002335310 (hide)

Owner ETH ZURICH

Inventors VON KANEL, Hans

Pub. Number AU-A-2002335310

PCT Number PCT/EP02/09922

PCT Pub. Number WO2003/044839

Priority 01127834.8 22.11.01 EP

Filing date 5 September 2002

Wipo publication date 10 June 2003

International Classifications

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

13 February 2003 Complete Application Filed

  Priority application(s): 01127834.8 22.11.01 EP

21 August 2003 Application Open to Public Inspection

  Published as AU-A-2002335310

5 August 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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