Method for cleaning the surface of a silicon substrate

Details for Australian Patent Application No. 2010288392 (hide)

Owner Ecole Polytechnique Centre National De La Recherche Scientifique

Inventors Roca I Cabarrocas, Pere; Moreno, Mario

Agent Watermark

Pub. Number AU-A-2010288392

PCT Pub. Number WO2011/023893

Priority 0955766 24.08.09 FR

Filing date 23 August 2010

Wipo publication date 3 March 2011

International Classifications

H01L 31/18 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

C30B 29/06 (2006.01) Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape - Silicon

C30B 33/12 (2006.01) After-treatment of single crystals or homogeneous polycrystalline material with defined structure

Event Publications

15 March 2012 PCT application entered the National Phase

  PCT publication WO2011/023893 Priority application(s): WO2011/023893

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