Method and device for treating substrates

Details for Australian Patent Application No. 2010270288 (hide)

Owner Gebr. Schmid GmbH

Inventors Kappler, Heinz; Lampprecht, Jorg

Agent Griffith Hack

Pub. Number AU-A-2010270288

PCT Pub. Number WO2011/003880

Priority 10 2009 032 217.5 06.07.09 DE

Filing date 5 July 2010

Wipo publication date 13 January 2011

International Classifications

G03F 7/42 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Stripping or agents therefor

G03F 7/30 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Imagewise removal using liquid means

H01L 21/00 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 31/18 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof

Event Publications

12 January 2012 PCT application entered the National Phase

  PCT publication WO2011/003880 Priority application(s): WO2011/003880

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