SOI substrate manufacturing method

Details for Australian Patent Application No. 2009314986 (hide)

Owner Shin-Etsu Chemical Co., Ltd.

Inventors Akiyama, Shoji; Ito, Atsuo

Agent Wrays

Pub. Number AU-A-2009314986

PCT Pub. Number WO2010/055857

Priority 2009-256854 10.11.09 JP; 2008-290287 12.11.08 JP

Filing date 11 November 2009

Wipo publication date 20 May 2010

International Classifications

H01L 21/02 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof -

H01L 27/12 (2006.01) Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate - the substrate being other than a semiconductor body, e.g. an insulating body

Event Publications

9 June 2011 PCT application entered the National Phase

  PCT publication WO2010/055857 Priority application(s): WO2010/055857

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