Method and device for treating silicon wafers

Details for Australian Patent Application No. 2008337880 (hide)

Owner Gebr. Schmid GmbH & Co.

Inventors Kappler, Heinz

Agent Griffith Hack

Pub. Number AU-A-2008337880

PCT Pub. Number WO2009/077201

Priority 10 2007 063 202.0 19.12.07 DE

Filing date 18 December 2008

Wipo publication date 25 June 2009

International Classifications

B05C 1/02 (2006.01) Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating - for applying liquid or other fluent material to separate articles

B05C 1/08 (2006.01) Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating - using a roller

H01L 21/00 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

22 July 2010 PCT application entered the National Phase

  PCT publication WO2009/077201 Priority application(s): WO2009/077201

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2008337890-Hardening composition

2008337876-Insecticidal compounds