RADIATION-SENSITIVE RESIN COMPOSITION

Details for Australian Patent Application No. 2003296188 (hide)

Owner JSR CORPORATION

Inventors NISHIMURA, Isao; FUJIWARA, Kouichi; KOBAYASHI, Eiichi; SHIMOKAWA, Tsutomu; NAKAMURA, Atsushi; YONEDA, Eiji; WANG, Yong

Pub. Number AU-A-2003296188

PCT Number PCT/JP2003/0166

PCT Pub. Number WO2004/061525

Priority 2002/383840 28.12.02 JP

Filing date 24 December 2003

Wipo publication date 29 July 2004

International Classifications

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

C08F 004/00 Polymerisation catalysts

Event Publications

29 April 2004 Complete Application Filed

  Priority application(s): 2002/383840 28.12.02 JP

2 September 2004 Application Open to Public Inspection

  Published as AU-A-2003296188

15 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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