Owner HONEYWELL INTERNATIONAL INC.

Inventors POSS, Andrew, J.; MA, Jing, Ji; VAN DER PUY, Michael; NALEWAJEK, David; NAIR, Haridasan, K.

Pub. Number AU-A-2003291279

PCT Number PCT/US2003/0352

PCT Pub. Number WO2004/041760

Priority Not Given 30.10.03 US; 60/432,886 05.11.02 US

Filing date 3 November 2003

Wipo publication date 7 June 2004

C07C 033/44 Unsaturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms

C07C 035/52 Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring

C08F 032/08 Homopolymers or copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system

G02B 001/04 Optical elements characterised by the material of which they are made - made of organic materials, e.g. plastics

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 007/09 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - characterised by structural details, e.g. supports, auxiliary layers

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists