CLEANING AGENT COMPOSITION, CLEANING AND PRODUCTION METHODS FOR SEMICONDUCTOR WAFER, AND SEMICONDUCTOR WAFER

Details for Australian Patent Application No. 2003285760 (hide)

Owner SHOWA DENKO K.K.

Inventors AMEMIYA, Masahiro; TANAKA, Yoshio

Pub. Number AU-A-2003285760

PCT Number PCT/JP2003/0157

PCT Pub. Number WO2004/053045

Priority 2002-361149 12.12.02 JP; 60/434,663 20.12.02 US

Filing date 10 December 2003

Wipo publication date 30 June 2004

International Classifications

C11D 011/00 Special methods for preparing compositions containing mixtures of detergents

C11D 003/30 Other compounding ingredients of detergent compositions covered in group

H01L 021/302 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/306 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C11D 001/722 Surface-active non-soap detergents - Ethers of polyoxyalkylenes having mixed oxyalkylene groups

Event Publications

1 April 2004 Complete Application Filed

  Priority application(s): 2002-361149 12.12.02 JP; 60/434,663 20.12.02 US

5 August 2004 Application Open to Public Inspection

  Published as AU-A-2003285760

1 September 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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