METHOD FOR CORRECTING ASTIGMATISM, METHOD FOR DETERMINING ASTIGMATIC SENSITIVITY AND METHOD FOR EXPOSURE IN CHARGED PARTICLE BEAM ALIGNER

Details for Australian Patent Application No. 2003264482 (hide)

Owner NIKON CORPORATION

Inventors SHIMIZU, Hiroyasu

Pub. Number AU-A-2003264482

PCT Number PCT/JP03/11879

PCT Pub. Number WO2004/030056

Priority 2002-276830 24.09.02 JP; 2003-202216 28.07.03 JP

Filing date 18 September 2003

Wipo publication date 19 April 2004

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01J 037/153 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

H01J 037/305 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - for casting, melting, evaporating, or etching

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

11 December 2003 Complete Application Filed

  Priority application(s): 2002-276830 24.09.02 JP; 2003-202216 28.07.03 JP

20 May 2004 Application Open to Public Inspection

  Published as AU-A-2003264482

9 June 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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