PLASMA PROCESSING DEVICE AND CONTROLLING METHOD THEREFOR

Details for Australian Patent Application No. 2003252258 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors ISHII, Nobuo; SHINOHARA, Kibatsu

Pub. Number AU-A-2003252258

PCT Number PCT/JP03/09404

PCT Pub. Number WO2004/010746

Priority 2002-215503 24.07.02 JP

Filing date 24 July 2003

Wipo publication date 9 February 2004

International Classifications

H05H 001/00 Generating plasma

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/511 Chemical deposition or plating by decomposition

Event Publications

16 October 2003 Complete Application Filed

  Priority application(s): 2002-215503 24.07.02 JP

18 March 2004 Application Open to Public Inspection

  Published as AU-A-2003252258

21 April 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

18 August 2005 Corrigenda

  Applications OPI - Name Index Under the name TOKYO ELECTRON LIMITED, Application No. 2003252258, under INID (71) correct the name to read NIHON KOSHUHA CO.,LTD.; TOKYO ELECTRON LIMITED

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