SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

Details for Australian Patent Application No. 2003242422 (hide)

Owner ANELVA CORPORATION

Inventors NAKAGAWARA, Hitoshi; IGAWA, Seiichi; UNEHARA, Yoshifumi

Pub. Number AU-A-2003242422

PCT Number PCT/JP03/06454

PCT Pub. Number WO2003/100848

Priority 2002-148690 23.05.02 JP

Filing date 23 May 2003

Wipo publication date 12 December 2003

International Classifications

H01L 021/68 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 014/56 Coating by vacuum evaporation, by sputtering or by ion implantation - Apparatus specially adapted for continuous coating

B65G 049/07 Conveying systems characterised by their application for specified purposes not otherwise provided for - for semiconductor wafers

Event Publications

11 September 2003 Complete Application Filed

  Priority application(s): 2002-148690 23.05.02 JP

5 February 2004 Application Open to Public Inspection

  Published as AU-A-2003242422

3 March 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2003242423-SPUTTERING TARGET MATERIAL

2003242421-MAGNETO-OPTICAL RECORDING MEDIUM, MANUFACTURING METHOD THEREOF, AND MAGNETO-OPTICAL RECORDING DEVICE