ROOM-TEMPERATURE MOLTEN SALT, PROCESS FOR PRODUCING THE SAME AND APPLICATIONS THEREOF

Details for Australian Patent Application No. 2003242371 (hide)

Owner DAIKIN INDUSTRIES, LTD.

Inventors ADACHI, Kenji; KUROKI, Yoshichika; SAKAMAKI, Yuuko

Pub. Number AU-A-2003242371

PCT Number PCT/JP03/07529

PCT Pub. Number WO2003/106419

Priority 2003-27251 04.02.03 JP; 2002-177036 18.06.02 JP

Filing date 13 June 2003

Wipo publication date 31 December 2003

International Classifications

C07D 213/20 Heterocyclic compounds containing six-membered rings, not condensed with other rings, with one nitrogen atom as the only ring hetero atom and three or more double bonds between ring members or between ring members and non-ring members

C07C 311/48 Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups

H01M 010/40 Secondary cells

H01B 001/06 Conductors or conductive bodies characterised by the conductive materials - mainly consisting of other non-metallic substances

H01M 008/02 Fuel cells - Details

H01M 014/00 Electrochemical current or voltage generators not provided for in groups

H01G 009/038 Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices

H01G 009/035 Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices

C07D 233/56 Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings

C07C 309/65 Sulfonic acids

Event Publications

11 September 2003 Complete Application Filed

  Priority application(s): 2003-27251 04.02.03 JP; 2002-177036 18.06.02 JP

26 February 2004 Application Open to Public Inspection

  Published as AU-A-2003242371

10 March 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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