PROCESSING DEVICE AND PROCESSING METHOD

Details for Australian Patent Application No. 2003242099 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors KOJIMA, Yasuhiko; ISHIZAKA, Tadahiro; GUNJI, Isao; KANNAN, Hiroshi; SAWADA, Ikuo

Pub. Number AU-A-2003242099

PCT Number PCT/JP03/07293

PCT Pub. Number WO2003/104525

Priority 2002-169321 10.06.02 JP

Filing date 9 June 2003

Wipo publication date 22 December 2003

International Classifications

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

11 September 2003 Complete Application Filed

  Priority application(s): 2002-169321 10.06.02 JP

19 February 2004 Application Open to Public Inspection

  Published as AU-A-2003242099

3 March 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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