COATING COMPOSITIONS FOR FORMING INSULATING THIN FILMS

Details for Australian Patent Application No. 2003207281 (hide)

Owner ASAHI KASEI KABUSHIKI KAISHA

Inventors LI, Jun; SHIRATAKI, Hironobu; HANAHATA, Hiroyuki; MATSUNO, Shinya; ARAKI, Toru

Pub. Number AU-A-2003207281

PCT Number PCT/JP03/01238

PCT Pub. Number WO2003/066750

Priority 2002-29966 06.02.02 JP; 2002-29971 06.02.02 JP

Filing date 6 February 2003

Wipo publication date 2 September 2003

International Classifications

C09D 005/25 Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced - Electrically-insulating paints or lacquers

C09D 183/04 Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only - Polysiloxanes

C09D 183/14 Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only - in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms

C09D 171/00 Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain

C09D 183/02 Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only - Polysilicates

Event Publications

17 July 2003 Complete Application Filed

  Priority application(s): 2002-29966 06.02.02 JP; 2002-29971 06.02.02 JP

25 September 2003 Application Open to Public Inspection

  Published as AU-A-2003207281

21 October 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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