SYSTEM FOR MEASURING MULTIAXIS PRESSURE GRADIENTS IN A SEMICONDUCTOR DURING A POLISHING PROCESS

Details for Australian Patent Application No. 2002357381 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors RANGARAJAN, Bharath; AVANZINO, Steven, C.; SUBRAMANIAN, Ramkumar; SINGH, Bhanwar

Pub. Number AU-A-2002357381

PCT Number PCT/US02/41412

PCT Pub. Number WO2003/057407

Priority 10/034,233 27.12.01 US

Filing date 23 December 2002

Wipo publication date 24 July 2003

International Classifications

B24B 037/04 Lapping machines or devices, i.e. requiring pulverulent abrading substances inserted between a lap of relatively soft but rigid material and the surface to be lapped - designed for working plane surfaces

B24B 049/04 Measuring

B24B 049/10 Measuring - involving electrical means

Event Publications

27 March 2003 Complete Application Filed

  Priority application(s): 10/034,233 27.12.01 US

4 September 2003 Application Open to Public Inspection

  Published as AU-A-2002357381

16 September 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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