INTEGRATED DRY-WET PROCESSING APPARATUS AND METHOD FOR REMOVING MATERIAL ON SEMICONDUCTOR WAFERS USING DRY-WET PROCESSES

Details for Australian Patent Application No. 2002350152 (hide)

Owner YONG, Bae, Kim

Inventors Not Given

Pub. Number AU-A-2002350152

PCT Number PCT/US02/35680

PCT Pub. Number WO2003/041149

Priority 60/346,000 07.11.01 US; 10/219,967 14.08.02 US; 60/346,000 07.11.01 US; 10/219,967 14.08.02 US

Filing date 6 November 2002

Wipo publication date 19 May 2003

International Classifications

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/469 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/469 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 March 2003 Complete Application Filed

  Priority application(s): 60/346,000 07.11.01 US; 10/219,967 14.08.02 US; 60/346,000 07.11.01 US; 10/219,967 14.08.02 US

28 August 2003 Application Open to Public Inspection

  Published as AU-A-2002350152

22 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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