ETCHING METHOD AND PLASMA ETCHER

Details for Australian Patent Application No. 2002349775 (hide)

Owner TOKYO ELECTRON LIMITED KABUSHIKI KAISHA TOSHIBA

Inventors KIDA, Hanako; ITO, Youbun; HAYASHI, Hisataka; NAGASEKI, Kazuya; HONDA, Masanobu; INAZAWA, Koichiro; YATSUDA, Koichi

Pub. Number AU-A-2002349775

PCT Number PCT/JP02/11844

PCT Pub. Number WO2003/043072

Priority 2002-115087 17.04.02 JP; 2001-349289 14.11.01 JP

Filing date 13 November 2002

Wipo publication date 26 May 2003

International Classifications

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

13 March 2003 Complete Application Filed

  Priority application(s): 2002-115087 17.04.02 JP; 2001-349289 14.11.01 JP

24 July 2003 Application Open to Public Inspection

  Published as AU-A-2002349775

29 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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