METHOD AND DEVICE FOR DRYING FLAT OBJECTS, IN PARTICULAR GALLIUM OR SILICON WAFERS OR OTHER LIKE SUBSTRATES

Details for Australian Patent Application No. 2002346886 (hide)

Owner SEMAX PROZESS TECHNIK GMBH

Inventors RIETMANN, Werner

Pub. Number AU-A-2002346886

PCT Number PCT/EP02/11986

PCT Pub. Number WO2003/038866

Priority 101 53 225.3 31.10.01 DE

Filing date 26 October 2002

Wipo publication date 12 May 2003

International Classifications

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

13 March 2003 Complete Application Filed

  Priority application(s): 101 53 225.3 31.10.01 DE

10 July 2003 Application Open to Public Inspection

  Published as AU-A-2002346886

15 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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