Method and device for generating uniform high-frequency plasma over large surface area used for plasma chemical vapor deposition apparatus

Details for Australian Patent Application No. 2002344594 (hide)

Owner Mitsubishi Heavy Industries, Ltd.

Inventors Kawamura, Keisuke; Takano, Akemi; Mashima, Hiroshi; Takatuka, Hiromu; Yamauti, Yasuhiro; Takeuchi, Yoshiaki; Sasakawa, Eishiro

Agent Davies Collison Cave

Pub. Number AU-B-2002344594

PCT Number PCT/JP02/11208

PCT Pub. Number WO2004/040629

Filing date 29 October 2002

Wipo publication date 25 May 2004

Acceptance publication date 9 June 2005

International Classifications

C23C 016/52 Chemical deposition or plating by decomposition - Controlling or regulating the coating process

C23C 016/509 Chemical deposition or plating by decomposition

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

27 February 2003 Complete Application Filed

15 July 2004 Application Open to Public Inspection

  Published as AU-B-2002344594

9 June 2005 Application Accepted

  Published as AU-B-2002344594

6 October 2005 Standard Patent Sealed

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