METHOD AND INSTRUMENT FOR MEASURING CONCENTRATION, METHOD AND UNIT FOR EXPOSURE TO LIGHT, AND METHOD FOR MANUFACTURING DEVICE

Details for Australian Patent Application No. 2002344570 (hide)

Owner NIKON CORPORATION

Inventors AOKI, Takashi

Pub. Number AU-A-2002344570

PCT Number PCT/JP02/11044

PCT Pub. Number WO2003/036696

Priority 2001-326609 24.10.01 JP

Filing date 24 October 2002

Wipo publication date 6 May 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G01N 027/409 Investigating or analysing materials by the use of electric, electro-chemical, or magnetic means - Oxygen concentration cells

G01N 001/00 Sampling

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 2001-326609 24.10.01 JP

3 July 2003 Application Open to Public Inspection

  Published as AU-A-2002344570

8 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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