METHOD AND DEVICE FOR GAS DISPLACEMENT, MASK PROTECTIVE DEVICE, MASK, AND METHOD AND DEVICE FOR EXPOSURE

Details for Australian Patent Application No. 2002344071 (hide)

Owner NIKON CORPORATION

Inventors NAGASAKA, Hiroyuki

Pub. Number AU-A-2002344071

PCT Number PCT/JP02/10552

PCT Pub. Number WO2003/034475

Priority 2001-313136 10.10.01 JP

Filing date 10 October 2002

Wipo publication date 28 April 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G03F 001/14 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals characterised by structural details, e.g. supports, cover layers, pellicle rings

Event Publications

27 February 2003 Complete Application Filed

  Priority application(s): 2001-313136 10.10.01 JP

3 July 2003 Application Open to Public Inspection

  Published as AU-A-2002344071

24 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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