PROJECTION OPTICAL SYSTEM AND EXPOSURE APPARATUS HAVING THE PROJECTION OPTICAL SYSTEM

Details for Australian Patent Application No. 2002335217 (hide)

Owner NIKON CORPORATION

Inventors OMURA, Yasuhiro

Pub. Number AU-A-2002335217

PCT Number PCT/JP02/10454

PCT Pub. Number WO2003/036361

Priority 2001-321463 19.10.01 JP

Filing date 8 October 2002

Wipo publication date 6 May 2003

International Classifications

G02B 013/24 Optical objectives specially designed for the purposes specified below - for reproducing or copying at short object distances

G02B 013/14 Optical objectives specially designed for the purposes specified below - for use with infra-red or ultra-violet radiation

G02B 001/02 Optical elements characterised by the material of which they are made

G02B 017/08 Systems with reflecting surfaces, with or without refracting elements - Catadioptric systems

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

13 February 2003 Complete Application Filed

  Priority application(s): 2001-321463 19.10.01 JP

3 July 2003 Application Open to Public Inspection

  Published as AU-A-2002335217

8 July 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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