PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE AND PRODUCTION METHOD FOR FIELD EFFECT TRANSISTOR AND SEMICONDUCTOR SUBSTRATE AND FIELD EFFECT TRANSISTOR

Details for Australian Patent Application No. 2002332241 (hide)

Owner SUMITOMO MITSUBISHI SILICON CORPORATION

Inventors SHIONO, Ichiro; MIZUSHIMA, Kazuki; YAMAGUCHI, Kenji

Pub. Number AU-A-2002332241

PCT Number PCT/JP02/08509

PCT Pub. Number WO2003/019632

Priority 2001-253175 23.08.01 JP

Filing date 23 August 2002

Wipo publication date 10 March 2003

International Classifications

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/336 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

6 February 2003 Complete Application Filed

  Priority application(s): 2001-253175 23.08.01 JP

5 June 2003 Application Open to Public Inspection

  Published as AU-A-2002332241

6 May 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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