REACTOR FOR THIN FILM DEPOSITION AND METHOD FOR DEPOSITING THIN FILM ON WAFER USING THE REACTOR

Details for Australian Patent Application No. 2002319934 (hide)

International Classifications

Event Publications

16 January 2003 Complete Application Filed

Priority application(s): 2001/43496 19.07.01 KR

22 May 2003 Application Open to Public Inspection

Published as AU-A-2002319934

8 April 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.