FLUOROPOLYMER-COATED PHOTOMASKS FOR PHOTOLITHOGRAPHY

Details for Australian Patent Application No. 2002316758 (hide)

Owner MICRO LITHOGRAPHY, INC.

Inventors WANG, Ching-Bore

Pub. Number AU-A-2002316758

PCT Number PCT/US02/23739

PCT Pub. Number WO2003/010606

Priority 09/916,732 26.07.01 US

Filing date 24 July 2002

Wipo publication date 17 February 2003

International Classifications

G03F 009/00 Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

G03F 007/11 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - having cover layers or intermediate layers, e.g. subbing layers

G03B 011/04 Filters or other obturators specially adapted for photographic purposes

B32B 027/00 Layered products essentially comprising synthetic resin

Event Publications

9 January 2003 Complete Application Filed

  Priority application(s): 09/916,732 26.07.01 US

29 May 2003 Application Open to Public Inspection

  Published as AU-A-2002316758

8 April 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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