PHASE CONFLICT RESOLUTION FOR PHOTOLITHOGRAPHIC MASKS

Details for Australian Patent Application No. 2002310374 (hide)

International Classifications

Event Publications

19 December 2002 Complete Application Filed

Priority application(s): 60/296,788 08.06.01 US; 60/304,142 10.07.01 US; 09/932,239 17.08.01 US

15 May 2003 Application Open to Public Inspection

Published as AU-A-2002310374

11 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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