HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM

Details for Australian Patent Application No. 2002254358 (hide)

Owner NAPP SYSTEMS, INC.

Inventors CASTILLO, Maria, Teresa, A.; HU, Yuxin; ROBERTS, David, H.; PAGUIO, Reny, R.

Pub. Number AU-A-2002254358

PCT Pub. Number WO2002/079879

Priority 09/823,904 30.03.01 US

Filing date 11 March 2002

Wipo publication date 15 October 2002

International Classifications

G03F 007/027 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

G03F 007/028 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - with photosensitivity-increasing substances, e.g. photoinitiators

G03F 007/033 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Event Publications

3 April 2003 Application Open to Public Inspection

  Published as AU-A-2002254358

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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