DEVICE AND METHOD FOR PLASMA PROCESSING, AND SLOW-WAVE PLATE

Details for Australian Patent Application No. 2002243002 (hide)

Owner TOKYO ELECTRON LIMITED OHMI, Tadahiro

Inventors OHMI, Tadahiro; SUGAWA, Shigetoshi; GOTO, Tetsuya; HIRAYAMA, Masaki

Pub. Number AU-A-2002243002

PCT Pub. Number WO2002/080253

Priority 2001-340995 06.11.01 JP; 2001-94276 28.03.01 JP

Filing date 28 March 2002

Wipo publication date 15 October 2002

International Classifications

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

Event Publications

3 April 2003 Application Open to Public Inspection

  Published as AU-A-2002243002

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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