PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE AND SEMICONDUCTOR ELEMENT

Details for Australian Patent Application No. 2002241303 (hide)

Owner TOYODA GOSEI CO., LTD.

Inventors NAGAI, Seiji; TOMITA, Kazuyoshi; IROKAWA, Yoshihiro; ITO, Kenji

Pub. Number AU-A-2002241303

PCT Pub. Number WO2002/082517

Priority 2001-099123 30.03.01 JP; 2001-099211 30.03.01 JP

Filing date 27 March 2002

Wipo publication date 21 October 2002

International Classifications

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/00 Chemical deposition or plating by decomposition

C30B 029/38 Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape

H01L 021/20 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 033/00 Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission

Event Publications

10 April 2003 Application Open to Public Inspection

  Published as AU-A-2002241303

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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